Onoda, Naka: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Focus, dynamics, and defectivity performance at wafer edge in immersion lithography

Tamura, Takao, Onoda, Naka, Fujita, Masafumi, Uchiyama, Takayuki

Year:

2008

Language:

english

File:

PDF, 1.91 MB

english, 2008

2

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Evaluation of immersion lithography processes for 55-nm node logic devices

Nakata, Taisaku, Lin, Qinghuang, Kodama, Teruhiko, Komori, Motofumi, Onoda, Naka, Uchiyama, Takayuki

Year:

2007

Language:

english

File:

PDF, 488 KB

english, 2007

3

[IEEE 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Berlin, Germany (2009.05.10-2009.05.12)] 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Defect reduction in ArF immersion lithography, using particle trap wafers with CVD thin films

Yoshinori Matsui,, Onoda, Naka, Seiji Nagahara,, Uchiyama, Takayuki

Year:

2009

Language:

english

File:

PDF, 453 KB

english, 2009

4

Rosai-dorfman disease with extranodal involvement

Hashimoto, Kaori, Kariya, Shin, Onoda, Tomoo, Ooue, Tetsuo, Yamashita, Yasuhiko, Naka, Kikuko, Okano, Mitsuhiro, Nishizaki, Kazunori

Journal:

The Laryngoscope

Year:

2014

Language:

english

File:

PDF, 432 KB

english, 2014

5

S≠1 impurity effect on phase transition in LiVO2

Takashi Naka, Masashige Onoda, Hiroshi Nagasawa

Journal:

Solid State Communications

Year:

1993

Language:

english

File:

PDF, 333 KB

english, 1993

6

NMR Studies for Spinel Phase Li x Zn 1- x V 2 O 4 System

Amako, Yasushi, Naka, Takashi, Onoda, Masashige, Nagasawa, Hiroshi, Erata, Tomoki

Journal:

Journal of the Physical Society of Japan

Year:

1990

File:

PDF, 1.06 MB

1990

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Flare management for 40-nm logic devices

Tanaka, Yuusuke, Conley, Will, Tamura, Takao, Fujimoto, Masashi, Tsubata, Kyoichi, Onoda, Naka, Fujii, Kiyoshi

Year:

2013

Language:

english

File:

PDF, 996 KB

english, 2013

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Defectivity improvement by modified wafer edge treatment in immersion lithography

Fujita, Masafumi, Levinson, Harry J., Dusa, Mircea V., Tamura, Takao, Onoda, Naka, Uchiyama, Takayuki

Year:

2009

Language:

english

File:

PDF, 2.25 MB

english, 2009

9

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - Highly accurate stitching method between cell projection and variably shaped e-beam shots

Kojima, Yoshikatsu, Onoda, Naka, Tokunaga, Kenichi, Nakajima, Ken, Nozue, Hiroshi, Vladimirsky, Yuli

Year:

1998

Language:

english

File:

PDF, 1.04 MB

english, 1998

10

Resist Heating in Cell Projection Electron Beam Direct Writing

Nakajima, Ken, Hirasawa, Satomi, Onoda, Naka, Nozue, Hirosi

Journal:

Japanese Journal of Applied Physics

Year:

1997

File:

PDF, 1.20 MB

1997

11

Phase Transition and Spin Dynamics in LiVO 2

Onoda, Masashige, Naka, Takashi, Nagasawa, Hiroshi

Journal:

Journal of the Physical Society of Japan

Year:

1991

File:

PDF, 554 KB

1991

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